Things to consider as starting points:
    What is the theoretical basis for the characterization technique, synthetic method and/or general theme?
    What are the nuts and bolts of the method, e.g. for a characterization technique samples size, geometry, sample prep, etc?
    What is the current state of the art regarding this topic?
    For instruments: Who are the leading manufacturers in the field and what is the typical cost of the instrument?
    For other topics: Who are the leading researchers in the field?
    What are the limitations associated with the topic? Is there room for improvement?

1.0 Introduction (200-250)
- what is optical lithography
- steps include spin coating of photoresists, soft bake, mask alignment, UV exposure, and development
- the relationship between feature resolution and wavelength of light
-do not include history

1.1 Technique of optical lithography (include one figure)
1.1.1 Contact lithography (150)
- what is contact lithography and the principles
1.1.2 Proximity lithography (150)
- what is proximity lithography and the principles
1.1.3 Projection lithography (150)
- what is projection lithography and the principles

1.2 Applications (150-200)
- general application
- what drives miniaturizationin chip fabrication.